This workshop continues a series started several years ago (2000 Bonassola, Italy; 2002 Trofaiach, Austria; 2003 Kerkrade, The Netherlands; 2005 Bad Honnef, Germany) devoted to the study of surface nano-patterning induced by ion collisions and other methods.

Tt is well established that self-assembly by ion sputtering, photon beam irradiation or epitaxial techniques can form regular patterns on surfaces, with typical dimensions in the nanometer range.

Substantial advances have been made in recent years in experiments and modelling of these far-from-equilibrium effects on various materials (including metals, semiconductors, amorphous surfaces). More recently, this technique has been applied to several applications requiring tailored surface properties, including chemical activity, optical behavior, magnetism at surfaces and surface wettability

The focus of this workshop will be on modelling and simulation activities that address the gap between atomistic and continuum approaches of self-assembly on surfaces, recent progress in experiments and theory in this field and challenges in combining micro-scale patterning by Focused Ion Beams (FIB), a top-down approach, with surface self-assembly.

A list of the major topics tobe covered in this workshop includes:

• Nanoscale surface features: patterning by ions, photon irradiation and epitaxy
• Modelling and atomistic simulations of nano-pattern formation
• Modification of physical properties by nano-patterning
• Patterning at sub-micron scale by Focused Ion Beams

Internationally-known experts from Europe, America and Asia will attend this workshop. Post-Doctoral researchers and graduate students are strongly invited to participate and present their most recent results.